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Silicon Wafer
Post-Lap Cleaning >> Vector HTC-Plus


VECTOR HTC-PLUS is an alkaline, water-based ultrasonic/megasonic detergent formulated to increase the cavitational energy released upon the substrate surface for more effective cleaning. Used at economical dilution ratios, VECTOR HTC-PLUS will remove light organics and sub-micron particles, and is typically used to remove post-process residues after grinding, slicing, lapping and polishing. VECTOR HTC-PLUS can be used in heated or unheated ultrasonic tanks, and is also recommended for brush and dip tank applications.


  • Superior wetting ability
  • Free rinsing - leaves no film or residue
  • Fully compatible with other VECTOR products

It is recommended that evaluation of VECTOR HTC-PLUS begin at a dilution of 2% mixed with deionized (DI) water, although tap water that does not contain hard water ions is also acceptable. Since the type and degree of residue to be removed varies, these factors will ultimately determine specific “in-house” dilutions. Other factors to consider include wafer exposure time and the power of the ultrasonic equipment in use. For more complete directions, request document #DOC-DIR-HTC-PLUS.

Additional Information:
VECTOR Products are available in 5-gallon pails and 55-gallon drums, F.O.B. Bethel, Connecticut, and also include grinding fluids, sawing fluids, suspension agents for lapping/polishing slurries, and rinse/wet storage additives. Material Safety Data Sheets available upon request.


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